Search results for " MOS based devices"

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Solid State Properties of Anodic Hf-Nb Mixed Oxides

2016

In last decades, HfO2 and Nb2O5 have been extensively studied due to their many potential applications, from corrosion protection to CMOS (as high-k gate dielectrics) [1-2] and ReRAM technologies [3-4]. For these technological applications compact, uniform and flat oxides are necessary, and a detailed understanding of their physical properties as a function of the fabrication conditions is needful. Scientific community gradually shifted its interest from pure metal oxides to mixed metal oxides trying to exploit the advantages of pure oxides and to suppress their disadvantages. Mixed oxides can be grown on valve metals alloys by anodizing, a simple and low cost electrochemical process for pr…

Settore ING-IND/23 - Chimica Fisica ApplicataSolid State Properties Anodizing Hf-Nb Mixed Oxides MOS based devices ReRAM technologies
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